Gnieser, D.: search on Z-Library

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1

Characterization of nanoparticles by scanning electron microscopy in transmission mode

Buhr, E, Senftleben, N, Klein, T, Bergmann, D, Gnieser, D, Frase, C G, Bosse, H

Journal:

Measurement Science and Technology

Year:

2009

Language:

english

File:

PDF, 976 KB

english, 2009

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Alternative Lithographic Technologies II - Monte Carlo modeling of BSE reflection in e-beam writers

Alves, H., Herr, Daniel J. C., Johnsen, K.-P., Hahmann, P., Gnieser, D., Frase, C. G., Bosse, H.

Year:

2010

Language:

english

File:

PDF, 538 KB

english, 2010

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Optimization of BSE-detector for e-beam direct write lithography

Alves, H., Hahmann, P., Slodowski, M., Frase, C. G., Gnieser, D., Johnsen, K.-P., Bosse, H., Schellenberg, Frank M., La Fontaine, Bruno M.

Year:

2009

Language:

english

File:

PDF, 407 KB

english, 2009

4

Model-based SEM for dimensional metrology tasks in semiconductor and mask industry

Frase, C G, Gnieser, D, Bosse, H

Journal:

Journal of Physics D Applied Physics

Year:

2009

Language:

english

File:

PDF, 1.62 MB

english, 2009

5

A Virtual Instrument for SEM Uncertainty Analysis

Gnieser, Dominic, Frase, Carl Georg, Bosse, Harald, Tutsch, Rainer

Journal:

Key Engineering Materials

Year:

2014

Language:

english

File:

PDF, 868 KB

english, 2014

6

Model-Based Correction of Image Distortion in Scanning Electron Microscopy

Gnieser, Dominic, Frase, Carl Georg, Bosse, Harald, Tutsch, Rainer

Journal:

Key Engineering Materials

Year:

2010

Language:

english

File:

PDF, 493 KB

english, 2010

7

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - A new SEM CD operator verified against Monte Carlo simulations

Frase, C. G., Gnieser, D., Dirscherl, K., Buhr, E., Bosse, H., Archie, Chas N.

Year:

2007

Language:

english

File:

PDF, 1.05 MB

english, 2007

8

Electron permeable membranes for MEMS electron sources

F. Haase, P. Detemple, S. Schmitt, A. Lendle, O. Haverbeck, T. Doll, D. Gnieser, H. Bosse, G. Frase

Journal:

Sensors and Actuators A: Physical

Year:

2006

Language:

english

File:

PDF, 851 KB

english, 2006

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - SEM image modeling using the modular Monte Carlo model MCSEM

Johnsen, K.-P., Raymond, Christopher J., Frase, C. G., Bosse, H., Gnieser, D.

Year:

2010

Language:

english

File:

PDF, 1.04 MB

english, 2010

10

Extended culture ofCandida boidiniion methanol

M. Reuss, J. Gnieser, H. G. Reng, F. Wagner

Journal:

Applied Microbiology and Biotechnology

Year:

1975

Language:

english

File:

PDF, 465 KB

english, 1975

11

SPIE Proceedings [SPIE 25th European Mask and Lithography Conference - Dresden, Germany (Monday 12 January 2009)] 25th European Mask and Lithography Conference - SEM image contrast modeling for mask and wafer metrology

Frase, C. G., Gnieser, D., Johnsen, K.-P., Häßler-Grohne, W., Tutsch, R., Bosse, H., Behringer, Uwe F. W.

Year:

2009

Language:

english

File:

PDF, 958 KB

english, 2009

12

Recycling and urban water conservation

B. Mörgerli, J. Gnieser

Journal:

Water, Air & Soil Pollution

Year:

1978

Language:

english

File:

PDF, 506 KB

english, 1978

13

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Influences on accuracy of SEM based CD mask metrology with a view to the 32 nm node

Häßler-Grohne, W., Frase, C. G., Gnieser, D., Bosse, H., Richter, J., Wiswesser, A.

Year:

2008

Language:

english

File:

PDF, 986 KB

english, 2008

14

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - E-beam direct write alignment strategies for the next generation node

Alves, H., Hahmann, P., Kliem, K.-H., Weidenmueller, U., Jahr, S., Frase, C. G., Gnieser, D., Bosse, H., Zimmermann, R., Arndt, C., Schellenberg, Frank M.

Year:

2008

Language:

english

File:

PDF, 473 KB

english, 2008

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